Electron Beam Lithography (EBL) is a cutting-edge technique used to create extremely fine patterns required in the manufacture of semiconductor devices, nanotechnology, and other fields that demand high precision.

Unlike traditional photolithography that uses light, EBL employs a focused electron beam to draw custom shapes on a surface coated with an electron-sensitive resist. How Does EBL Work?Coating the Substrate: A thin layer of electron-sensitive resist material is applied to…