While learning Electron Beam Lithography, I kept seeing different beam-current values such as 25 pA, 1 nA and 12 nA. At first, I thought the choice should be simple. If a higher beam current means more electrons are reaching the…
While learning electron beam lithography, I kept seeing values such as 200 µC/cm², 300 µC/cm² or 500 µC/cm² in exposure conditions. I understood that these numbers were related to how much we expose the resist, but one thing confused me.…
By Gurwinder Singh Introduction When we talk about semiconductor chips, one sentence comes up again and again: “Modern chips contain billions of transistors.” I have heard this many times, and because of that, it is easy to start thinking that…
Published by Gurwinder Singh Introduction While learning Electron Beam Lithography, I came across two words again and again: Positive resist and negative resist. At first, I thought the names might have something to do with electrical charge. We are using…
By Gurwinder Singh Introduction During my work as a field service engineer, I spend most of my time around Electron Beam Lithography (EBL) systems. I see researchers loading wafers, selecting exposure recipes, and writing incredibly small patterns that are impossible…
Introduction In Part 1, we explored how researchers use Electron Beam Lithography (EBL) to transform scientific ideas into nanoscale devices. We looked at transistor development, quantum computing, and the research process that begins with a simple question and evolves through…
Introduction As a field service engineer, I spend a lot of time around Electron Beam Lithography systems. During customer visits, I meet researchers working on very different projects. One group may be building quantum devices, while another is studying graphene…
Published on July 12, 2026 GURWINDER SINGH 📖 9 min read Step 8 – Pattern Transfer: Converting the Resist Pattern into a Permanent Structure By the end of Step 7, the invisible electron beam exposure has been transformed into a visible…
Published on July 5, 2026 GURWINDER SINGH Introduction Modern semiconductor devices contain billions of transistors packed into an area no larger than a fingernail. As electronic devices continue to shrink, fabricating structures at the nanometer scale requires technologies capable of…
Unlike traditional photolithography that uses light, EBL employs a focused electron beam to draw custom shapes on a surface coated with an electron-sensitive resist. How Does EBL Work?Coating the Substrate: A thin layer of electron-sensitive resist material is applied to…