When working with Electron Beam Lithography (EBL), we normally talk about the electron beam after it has already been generated. We talk about beam current, aperture, focus, stigmatism, writing patterns and dose. But I had a more basic question: Where…
While learning more about electron beam lithography, I had one practical question. Suppose someone gives me a GDSII file and asks me to write the pattern using EBL. The pattern is already designed. The dimensions are already there in the…
While learning Electron Beam Lithography, I kept seeing different beam-current values such as 25 pA, 1 nA and 12 nA. At first, I thought the choice should be simple. If a higher beam current means more electrons are reaching the…
By Gurwinder Singh Introduction When we talk about semiconductor chips, one sentence comes up again and again: “Modern chips contain billions of transistors.” I have heard this many times, and because of that, it is easy to start thinking that…