When I first started learning about positioning in an EBL system, I thought alignment marks were mainly used to tell the machine where the wafer was. But then I had another question. If the wafer is already mounted on a…
While learning more about electron beam lithography, I had one practical question. Suppose someone gives me a GDSII file and asks me to write the pattern using EBL. The pattern is already designed. The dimensions are already there in the…
While learning electron beam lithography, I kept seeing values such as 200 µC/cm², 300 µC/cm² or 500 µC/cm² in exposure conditions. I understood that these numbers were related to how much we expose the resist, but one thing confused me.…